JPH054604B2 - - Google Patents

Info

Publication number
JPH054604B2
JPH054604B2 JP62221538A JP22153887A JPH054604B2 JP H054604 B2 JPH054604 B2 JP H054604B2 JP 62221538 A JP62221538 A JP 62221538A JP 22153887 A JP22153887 A JP 22153887A JP H054604 B2 JPH054604 B2 JP H054604B2
Authority
JP
Japan
Prior art keywords
wafer
mask
diffraction grating
positional deviation
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62221538A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6463802A (en
Inventor
Ryoji Tanaka
Hidekazu Kono
Joji Iwata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP62221538A priority Critical patent/JPS6463802A/ja
Priority to US07/145,355 priority patent/US4815854A/en
Publication of JPS6463802A publication Critical patent/JPS6463802A/ja
Publication of JPH054604B2 publication Critical patent/JPH054604B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Control Of Position Or Direction (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62221538A 1987-01-19 1987-09-03 Detecting method for positional slippage of mask and wafer Granted JPS6463802A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP62221538A JPS6463802A (en) 1987-09-03 1987-09-03 Detecting method for positional slippage of mask and wafer
US07/145,355 US4815854A (en) 1987-01-19 1988-01-19 Method of alignment between mask and semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62221538A JPS6463802A (en) 1987-09-03 1987-09-03 Detecting method for positional slippage of mask and wafer

Publications (2)

Publication Number Publication Date
JPS6463802A JPS6463802A (en) 1989-03-09
JPH054604B2 true JPH054604B2 (en]) 1993-01-20

Family

ID=16768288

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62221538A Granted JPS6463802A (en) 1987-01-19 1987-09-03 Detecting method for positional slippage of mask and wafer

Country Status (1)

Country Link
JP (1) JPS6463802A (en])

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002151999A (ja) * 2000-11-09 2002-05-24 Nec Corp 弾性表面波フィルタ装置および弾性表面波フィルタを収容するためのパッケージ

Also Published As

Publication number Publication date
JPS6463802A (en) 1989-03-09

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